One-step growth of thin film SnS with large grains using MOCVD
نویسندگان
چکیده
منابع مشابه
One-step growth of thin film SnS with large grains using MOCVD
Thin film tin sulphide (SnS) films were produced with grain sizes greater than 1 μm using a one-step metal organic chemical vapour deposition process. Tin-doped indium oxide (ITO) was used as the substrate, having a similar work function to molybdenum typically used as the back contact, but with potential use of its transparency for bifacial illumination. Tetraethyltin and ditertiarybutylsulphi...
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In this paper thin films of tin sulfide (SnS) were deposited on the glass substrates using spray pyrolysis method with the substrate temperatures in the range of 400–600℃, keeping the other deposition parameters constant. In this work the characteristic of SnS thin films investigated. The XRD pattern and optical transmittance of thin films also are discussed. With the change in concen...
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ژورنال
عنوان ژورنال: Science and Technology of Advanced Materials
سال: 2018
ISSN: 1468-6996,1878-5514
DOI: 10.1080/14686996.2018.1428478